A model for reactive ion etching of PZT thin films

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 456-460

  Suchaneck, G ^a   Tews, R ^b   Gerlach, G ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b SIMEC GmbH and Co OHG   (Germany)

Author keywords

Electron kinetics; Plasma modeling; PZT etching

Indexed keywords

CARRIER CONCENTRATION; FERROELECTRIC MATERIALS; ION BOMBARDMENT; LEAD COMPOUNDS; REACTIVE ION ETCHING; SURFACE CHEMISTRY;

LEAD ZIRCONATE TITANATE;

DIELECTRIC FILMS;

EID: 0033317981     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00101-2     Document Type: Article

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