Preparation and characterizations of high-K (Ca, Sr)ZrO3 gate dielectric thin films by sol-gel technology

Integrated Ferroelectrics

Volumn 61, Issue , 2004, Pages 25-35

  Zhu, W ^a   Yu, T ^a   Chen, C H ^a   Chen, X F ^a   Krishnan, R G ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

High K gate dielectrics; Sol gel method; Thin film

Indexed keywords

DIELECTRIC DEVICES; DIFFERENTIAL THERMAL ANALYSIS; PEROVSKITE; SCANNING ELECTRON MICROSCOPY; SOL-GELS; THERMOGRAVIMETRIC ANALYSIS; ZINC OXIDE;

HIGH K GATE DIELECTRICS; METALLOORGANIC DECOMPOSITION (MOD); SOL GEL WET CHEMICAL TECHNOLOGY; SOLID SOLUTION SYSTEMS;

THIN FILMS;

EID: 33751160397     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580490458883     Document Type: Article

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