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Journal of Materials Research

Volumn 17, Issue 2, 2002, Pages 267-270

Chemical vapor deposition of cobalt using novel cobalt(I) precursors

(3) Choi, Hyungsoo a Park, Sungho a Jang, Ho G b

a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

b Korea University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COBALT; FILM GROWTH; HYDRIDES; MICROSTRUCTURE; SUBSTRATES; THERMAL EFFECTS;

COBALT PRECURSORS;

THIN FILMS;

EID: 0036477603 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2002.0037 Document Type: Article

Times cited : (5)

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