Novel nickel precursors for chemical vapor deposition

Chemistry of Materials

Volumn 15, Issue 20, 2003, Pages 3735-3738

  Choi, Hyungsoo ^a   Park, Sungho ^a   Hyung Kim, Tae ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEXES;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPLEXATION; MORPHOLOGY; NICKEL COMPOUNDS; SURFACE ROUGHNESS;

METALLIC FILMS;

NICKEL COMPLEX;

ARTICLE; ATOMIC FORCE MICROSCOPY; FILM; MORPHOLOGY; SURFACE PROPERTY; TEMPERATURE; VAPOR; VOLATILIZATION;

EID: 0141529850     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm034210x     Document Type: Article

References (20)

1. Mond, L. J. Chem. Soc. 1885, 945.
2. Stauf, G.; Driscoll, D.; Dowben, P.; Barfuss, S.; Grade, M. Thin Solid Films 1987, 153, 421.
3. Kaesz, H. D.; Williams, R.; Hicks, R.; Chen, Y.; Xue, Z.; Xu, D.; Shuh, D.; Thridandam, H. Mater. Res. Soc. Symp. Proc. 1989, 395.
4. Fraser, B.; Hampp, A.; Kaesz, H. D. Chem. Mater. 1996, 8, 1858.
5. Senocq, F.; Urrutigoity, M.; Caubel, Y.; Gorrichon, J.-P.; Gleizes, A. Inorg. Chim. Acta 1999, 288, 233.
6. Maruyama, T.; Tago, T. J. Mater. Sci. 1993, 20, 5345.
7. Van Hemert, R.; Spenlove, L.; Sievers, R. J. Electrochem. Soc. 1965, 112, 1123.
8. Becht, M.; Gallus, J.; Hunziker, M.; Atamny, F.; Dahmen, K.-H. J. Phys. IV 1995, 5, 465.
9. Martin, J. D.; Hogan, P.; Abboud, K. A.; Dahmen K.-H. Chem. Mater. 1998, 10, 2525.
10. Brissommeau L.; Sahnoun R.; Mijoule C.; Vahlas C. J. Electrochem. Soc. 2000, 147, 1443.
11. Kang, J.-K.; Rhee S.-W. J. Mater. Res. 2000, 1828.
12. Brissonneu, L.; Vahlas, C. Chem. Vap. Deposition 1999, 5, 135.
13. Brissonneu, L.; Caro, D.; Boursier, D.; Madar, R.; Vahlas, C. Chem. Vap. Deposition 1999, 5, 143.
14. Leto, J. R.; Leto, M. F. J. Am. Chem. Soc. 1961, 83, 2944.
15. Cramer, R.; Lindsay, R. V., Jr. J. Am. Chem. Soc. 1966, 88, 3534.
16. Vinal, R. S.; Reynolds, I. T. Inorg. Chem. 1964, 3, 1062.
17. 4: C, 39.85; H, 8.36. Found: C, 40.08; H, 8.57.
18. Landauer, S. R.; Rydon, H. N. J. Chem. Soc. 1953, 2224.
19. 2NH was added dropwise until the color of the solution changed to pink. Solid products were filtered and washed with cold methanol followed by drying under vacuum at room temperature. For the liquid products, the solvent was removed under vacuum and the residue was extracted with THF. The extracts were concentrated and eluted through neutral alumina. The product was isolated by removing the solvent and free phosphite under vacuum.
20. XPS spectra were obtained by using a Physical Electronics PHI 5400 X-ray photoelectron spectrometer with a monochromatized Mg Kα X-ray source (1253.6 eV). All the films were cleaned extensively by sputtering with argon at 8 keV before data collection. SEM and AFM images were taken from a Hitachi S-4700 scanning electron microscope and a Digital Instruments Multimode NanoScope IIIa, respectively.