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Volumn 24, Issue 6, 2006, Pages 1985-1991
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Effects of oxygen pressure on the microstructure of LaNiO3 conductive thin film monitored by in situ reflection high energy diffraction
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Author keywords
[No Author keywords available]
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Indexed keywords
CONDUCTIVE FILMS;
ELECTRON DIFFRACTION;
ELECTRON REFLECTION;
IN SITU PROCESSING;
LANTHANUM COMPOUNDS;
MICROSTRUCTURE;
OXYGEN;
PRESSURE EFFECTS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CHEMICAL VALENCE;
IN SITU REFLECTION HIGH ENERGY DIFFRACTION;
LNO THIN FILMS;
OXYGEN PRESSURE;
THIN FILMS;
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EID: 33750945837
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2338556 Document Type: Article |
Times cited : (5)
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References (15)
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