Precise control of surface wettability of mixed monolayers using a simple wiping method

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2079-2084

  Lim, Jung Ah ^a   Cho, Jeong Ho ^a   Jang, Yunseok ^a   Han, Joong Tark ^a   Cho, Kilwon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Inkjet printing; Self assembled monolayer; Soft lithography; Wettability; X ray photoelectron spectroscopy

Indexed keywords

DEPOSITION; LITHOGRAPHY; PRINTING; SELF ASSEMBLY; X RAY PHOTOELECTRON SPECTROSCOPY;

MIXED MONOLAYERS; SOFT LITHOGRAPHY; WIPING METHOD;

MONOLAYERS;

DEPOSITION; ESCA; INK JET PRINTING; LITHOGRAPHY; MONOLAYERS; WETTABILITY; X RAY SPECTROSCOPY;

EID: 33750831563     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.003     Document Type: Article

References (31)

1. Xia Y., and Whitesides G.M. Angew. Chem., Int. Ed. Engl. 110 (1998) 568
2. Datwani S.S., Vijayendran R.A., Johnson E., and Biondi S.A. Langmuir 20 (2004) 4970
3. de Gans B.-J., Duineveld P.C., and Schubert U.S. Adv. Mater. 16 (2004) 203
4. Ulman A. An Introduction to Ultrathin Organic Films (1991), Academic Press, Boston
5. Plueddemann E.P. Silane Coupling Agents. 2nd ed. (1991), Plenum Press, New York
6. Kim D.H., Park Y.D., Jang Y., Yang H., Kim Y.H., Moon D.G., Han J.I., Park S., Chang T., Joo M., Ryu C.Y., and Cho K. Adv. Funct. Mater. 15 (2005) 77
7. Mathauser K., and Frank C.W. Langmuir 9 (1993) 3002
8. Kitaev V., Minseok S., McGovern M.E., Huang Y.-J., and Kumacheva E. Langmuir 17 (2001) 4274
9. Offord D.A., and Griffin J.H. Langmuir 9 (1993) 3015
10. Heise A., Stamm M., Rauscher M., Duschner H., and Menzel H. Thin Solid Films 327-329 (1998) 199
11. Le Grange J.D., Markham J.L., and Kurjian C.R. Langmuir 9 (1993) 1749
12. Banga R., and Yarwood J. Langmuir 11 (1995) 4393
13. Rozlosnik N., Gerstenberg M.C., and Larsen N.B. Langmuir 19 (2003) 1182
14. Tripp C.P., and Hair M.L. Langmuir 8 (1992) 1120
15. Iimura K., Nakajima Y., and Kato T. Thin Solid Films 379 (2000) 230
16. Lee D.H., Kim D., Oh T., and Cho K. Langmuir 20 (2004) 8124
17. Snyder R.G., Strauss H.L., and Elliger C.A. J. Phys. Chem. 86 (1982) 5145
18. Onclin S., Mulder A., Huskens J., Ravoo B.J., and Reinhoudt D.N. Langmuir 20 (2004) 5460
19. Wesserman S.R., Tao Y.-T., and Whitesides G.M. Langmuir 5 (1989) 1074
20. McGovern M.E., Kallury K.M.R., and Thompson M. Langmuir 10 (1994) 3607
21. Balachander N., and Sukenik C.N. Langmuir 6 (1990) 1621
22. Silberzan P., Leger L., Ausserre D., and Benattar J.J. Langmuir 7 (1991) 1647
23. Folkers J.P., Laibinis P.E., and Whitesides G.M. Langmuir 8 (1992) 1330
24. Vallant T., Kattner J., Brunner H., Mayer U., and Hoffmann H. Langmuir 15 (1999) 5339
25. Fryxell G.E., Rieke P.C., Wood L.L., Engelhard M.H., Williford R.E., Graff G.L., Campbell A.A., Wiacek R.J., Lee L., and Halverson A. Langmuir 12 (1996) 5064
26. de Gans B.-J., and Schubert U.S. Langmuir 20 (2004) 7789
27. Bert Groenendaal L., Joans F., Freitag D., Pielartzik H., and Reynolds J.R. Adv. Mater. 12 (2000) 481
28. Sirringhaus H., Kawase T., Friend R.H., Shimoda T., Inbasekaran M., Wu W., and Woo E.P. Science 290 (2000) 2123
29. de Jong M.P., van Ijzendoorn L.J., and de Voigt M.J. Appl. Phys. Lett. 77 (2000) 2255
30. Shon Y., Colorado R., Williams C.T., Bain C.D., and Lee T.R. Langmuir 16 (2000) 541
31. Shon Y., Lee S., Colorado R., Perry S.S., and Lee T.R. J. Am. Chem. Soc. 122 (2000) 7556