The improvement in ferroelectric performance of (Bi3.15Nd0.85)4Ti3O12 films by the addition of hydrogen peroxide in a spin-coating solution

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1683-1687

  Chang, Yi Chun ^a   Kuo, Dong Hau ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

Ceramics; Chemical deposition; Electrical properties and measurements; Ferroelectric properties; Oxides

Indexed keywords

ANNEALING; CERAMIC MATERIALS; ELECTRIC PROPERTIES; FERROELECTRICITY; HYDROGEN PEROXIDE; SYNTHESIS (CHEMICAL);

CHEMICAL DEPOSITION; ELECTRICAL MEASUREMENTS; FATIGUE ENDURANCE; FERROELECTRIC PROPERTIES; OXYGEN VACANCIES;

THIN FILMS;

EID: 33750824276     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.06.024     Document Type: Article

References (19)

1. Araujo C.A.P., Cuchiaro J.D., McMillan L.D., Scott M.C., and Scott J.F. Nature 374 (1995) 627
2. Park B.H., Kang B.S., Bu S.D., Noh T.W., Lee J., and Jo W. Nature 401 (1999) 682
3. Chon U., Jang H.M., Kim M.G., and Chang C.H. Phys. Rev. Lett. 89 (2002) 087601
4. Tasi H.M., Lin P., and Tseng T.Y. Appl. Phys. Lett. 72 (1998) 1787
5. Chon U., Shim J.S., and Jang H.M. Solid State Commun. 129 (2004) 465
6. Chon U., Kim K.B., Jang H.M., and Yi G.C. Appl. Phys. Lett. 79 (2001) 3137
7. Kim K.T., Kim C.I., Kang D.H., and Shim I.W. Thin Solid Films 422 (2002) 230
8. Watanabe T., Kojima T., Sakai T., Funakubo H., Osada M., Noguchi Y., and Miyayama M. J. Appl. Phys. 92 (2002) 1518
9. Kim S.S., Bae J.C., and Kim W.J. J. Cryst. Growth 274 (2005) 394
10. Soyama N., Maki K., Mori S., and Ogi K. Jpn. J. Appl. Phys. 39 (2000) 5434
11. Adachi Y., Su D., Muralt P., and Setter N. Appl. Phys. Lett. 86 (2005) 172904
12. Chiou T.Y., and Kuo D.H. Appl. Phys. Lett. 85 (2004) 3196
13. Sun Y.M., Chen Y.C., Gan J.Y., and Hwang J.C. Appl. Phys. Lett. 81 (2002) 3221
14. Tagantsev A.K., Stolichnov I., Colla E.L., and Setter N. J. Appl. Phys. 90 (2001) 1387
15. Chiou T.Y., and Kuo D.H. Appl. Phys. Lett. 86 (2005) 032910
16. Tomar M.S., Melgarejo R.E., Hidalgo A., Mazumder S.B., and Katiyar R.S. Appl. Phys. Lett. 83 (2003) 341
17. Lee H.N., Hesse D., Zakharov N., and Gösele U. Science 296 (2002) 2006
18. Lee J.J., Thio C.L., and Desu S.B. J. Appl. Phys. 78 (1995) 5073
19. Nuffer J., Lupascu D.C., Rödel J., and Schroeder M. Appl. Phys. Lett. 79 (2001) 3675