Preparation and evaluation of Pb(Zr, Ti)O3 thin films for low voltage operation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 9 B, 2000, Pages 5434-5436

  Soyama, Nobuyuki ^a   Maki, Kazunari ^a   Mori, Satoru ^a   Ogi, Katsumi ^a  

^a MITSUBISHI MATERIALS CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; ELECTRIC POTENTIAL; FILM PREPARATION; GRAIN SIZE AND SHAPE; HYSTERESIS; LEAD COMPOUNDS; MORPHOLOGY; NUCLEATION; SOL-GELS; SUBSTRATES; THICKNESS MEASUREMENT;

LEAD ZIRCONATE TITANATE; LOW VOLTAGE OPERATION; NUCLEATION DENSITY;

FERROELECTRIC THIN FILMS;

EID: 0034262415     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5434     Document Type: Article

References (5)

1. M. Fujiki, J. S. Cross, M. Tsukada, S. Otani, Y. Kotaka, Y. Goto, K. Matsuura and H. Ashida: Integr. Ferroelectr. 26 (1999) 269.
2. L. L. Boyer, N. Velasquez and J. T. Evans, Jr.: Jpn. J. Appl. Phys. 36 (1997) 5799.
3. K. Maki, N. Soyama, S. Mori K. Kageyama, M. Matsuura and K. Ogi: Proc. 9th US-Jpn Seminar on Dielectric and Piezoelectric Ceramics (1999) p. 203.
4. N. Soyama, K. Maki, S. Mori and K. Ogi: to be published in Proc. 12th Int. Symp. Integrated Ferroelectrics.
5. K. Maki, N. Soyama, S. Mori and K. Ogi: to be published in Proc. 12th Int. Symp. Integrated Ferroelectrics.