Pure Bi4Ti3O12 thin films with improved ferroelectric properties

Applied Physics Letters

Volumn 85, Issue 15, 2004, Pages 3196-3198

  Chiou, Tai Yi ^a   Kuo, Dong Hau ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; CHEMICAL BONDS; CRYSTALLIZATION; CURRENT DENSITY; CYCLIC VOLTAMMETRY; LEAKAGE CURRENTS; PEROVSKITE; POLARIZATION; SPIN COATING; SPUTTERING; SUBSTRATES; X RAY DIFFRACTION;

CHARGE DENSITY; DC SPUTTERING; FATIGUE ENDURANCE; FERROELECTRIC RANDOM ACCESS MEMORIES (FRAM);

FERROELECTRIC THIN FILMS;

EID: 8644289359     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1803934     Document Type: Article

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