Depth-resolved residual strain in MoN/Mo nanocrystalline films

Applied Physics Letters

Volumn 89, Issue 17, 2006, Pages

  Chen, Gang ^a   Singh, Dileep ^a   Eryilmaz, Osman ^a   Routbort, Jules ^a   Larson, Bennett C ^b   Liu, Wenjun ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; MAGNETRON SPUTTERING; X RAY DIFFRACTION ANALYSIS;

FILM PROCESSING; NANOCRYSTALLINE FILMS; STRAIN PROFILES;

NANOSTRUCTURED MATERIALS;

EID: 33750440503     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2364131     Document Type: Article

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