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Volumn 50, Issue 9-10, 2006, Pages 1667-1669

A low voltage SANOS nonvolatile semiconductor memory (NVSM) device

Author keywords

Al2O3; Low voltage; Nonvolatile Semiconductor Memory (NVSM); SANOS

Indexed keywords

ALUMINA; CAPACITORS; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; PERMITTIVITY; POLYSILICON; SILICA; SILICON; SILICON NITRIDE;

EID: 33750377597     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2006.07.010     Document Type: Article
Times cited : (26)

References (10)
  • 4
    • 0035872897 scopus 로고    scopus 로고
    • High-k gate dielectrics: current status and materials properties
    • Wilk G.D., Wallace R.M., and Anthony J.M. High-k gate dielectrics: current status and materials properties. Appl Phys Rev 89 (2001) 5243
    • (2001) Appl Phys Rev , vol.89 , pp. 5243
    • Wilk, G.D.1    Wallace, R.M.2    Anthony, J.M.3
  • 5
    • 0033728046 scopus 로고    scopus 로고
    • Charge retention of scaled SONOS nonvolatile memory devices at elevated temperatures
    • Yang Y., and White M.H. Charge retention of scaled SONOS nonvolatile memory devices at elevated temperatures. Solid-State Electron 44 (2000) 949
    • (2000) Solid-State Electron , vol.44 , pp. 949
    • Yang, Y.1    White, M.H.2
  • 6
    • 0037407807 scopus 로고    scopus 로고
    • Characterization of SONOS oxynitride nonvolatile semiconductor memory device
    • Wrazien S.J., Zhao Y., Krayer J.D., and White M.H. Characterization of SONOS oxynitride nonvolatile semiconductor memory device. Solid-State Electron 47 (2003) 885
    • (2003) Solid-State Electron , vol.47 , pp. 885
    • Wrazien, S.J.1    Zhao, Y.2    Krayer, J.D.3    White, M.H.4
  • 9
    • 33750337959 scopus 로고    scopus 로고
    • White MH, Zhao Y, Wang Y, Wrazien SJ, Krayer JD, Adams DA et al. Scaled SONOS NVSM devices for space and military applications. In: Non-volatile memory technology symposium, San Diego, CA, 2003.
  • 10
    • 0026253999 scopus 로고
    • New scaling guidelines for MNOS nonvolatile memory devices
    • Minami S.-I., and Kamigaki Y. New scaling guidelines for MNOS nonvolatile memory devices. IEEE Trans Electron Dev 38 (1991) 2519
    • (1991) IEEE Trans Electron Dev , vol.38 , pp. 2519
    • Minami, S.-I.1    Kamigaki, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.