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Volumn 102, Issue 3, 2006, Pages 2094-2098
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Polydnethyl methacrylate as masking material for microelectromechanical system (MEMS) fabrication
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Author keywords
Direct current (dc) sputtering; Masking materials; Poly(methyl methacrylate); Potassium hydroxide; X ray photoelectron spectroscopy
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Indexed keywords
CONTACT ANGLE;
ETCHING;
MASKS;
MICROELECTROMECHANICAL DEVICES;
SPUTTER DEPOSITION;
X RAY PHOTOELECTRON SPECTROSCOPY;
DIRECT CURRENT (DC) SPUTTERING;
MASKING LAYERS;
MASKING MATERIALS;
POTASSIUM HYDROXIDE;
POLYMETHYL METHACRYLATES;
ADHESION;
ANISOTROPY;
ELECTRONICS;
ETCHING;
POLYMETHYL METHACRYLATE;
SILICON;
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EID: 33750358093
PISSN: 00218995
EISSN: 10974628
Source Type: Journal
DOI: 10.1002/app.24091 Document Type: Article |
Times cited : (4)
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References (19)
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