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Volumn 102, Issue 3, 2006, Pages 2094-2098

Polydnethyl methacrylate as masking material for microelectromechanical system (MEMS) fabrication

Author keywords

Direct current (dc) sputtering; Masking materials; Poly(methyl methacrylate); Potassium hydroxide; X ray photoelectron spectroscopy

Indexed keywords

CONTACT ANGLE; ETCHING; MASKS; MICROELECTROMECHANICAL DEVICES; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33750358093     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.24091     Document Type: Article
Times cited : (4)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.