Maskless microetching of transparent conductive oxides (ITO and ZnO) and semiconductors (GaAs) based on reaction-diffusion

Chemistry of Materials

Volumn 18, Issue 20, 2006, Pages 4722-4723

  Smoukov, Stoyan K ^a   Grzybowski, Bartosz A ^a  

^a Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE MATERIALS; DIFFUSION; ETCHING; HYDROGELS; OPTOELECTRONIC DEVICES; ZINC OXIDE;

HYDROGEL STAMPS; MICROETCHING; MICROSTRUCTURING; SURFACE PATTERNING;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 33750282706     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm061468p     Document Type: Article

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