Process investigation of electron beam evaporation deposited amorphous silicon optical films

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 17, Issue 8, 2006, Pages 905-908

  Shu, Xiong Wen ^a   Xu, Chen ^a   Tian, Zeng Xia ^a   Luo, Dan ^a   Shen, Guang Di ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Amorphous silicon; Extinction coefficient; Refractive index; Semiconductor laser; Spectroscopic ellipsometer

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; ELECTRON BEAMS; EVAPORATION; MIRRORS; REFRACTIVE INDEX; SEMICONDUCTOR LASERS; SUBSTRATES;

CHAMBER PRESSURE; DEPOSITION RATE; EXTINCTION COEFFICIENT; HIGH REFLECTION MIRROR; SPECTROSCOPIC ELLIPSOMETER; SUBSTRATE TEMPERATURE;

OPTICAL FILMS;

EID: 33750218385     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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