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Volumn 2006, Issue , 2006, Pages 626-629

Piezoresistive MEMS underwater shear stress sensors

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FORCE CONTROL; IMAGE PROCESSING; MICROELECTROMECHANICAL DEVICES; SHEAR STRESS; VELOCIMETERS;

EID: 33750132212     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (13)

References (11)
  • 1
    • 79957981803 scopus 로고    scopus 로고
    • A wafer-bonded, floating element shear-stress sensor using a geometric moire optical transduction technique
    • Hilton Head Island, South Carolina, USA
    • S. Horowitz, et al., "A Wafer-Bonded, Floating Element Shear-Stress Sensor Using a Geometric Moire Optical Transduction Technique," Solid-State Sensor, Actuator and Microsystems Workshop, Hilton Head Island, South Carolina, USA, 2004.
    • (2004) Solid-state Sensor, Actuator and Microsystems Workshop
    • Horowitz, S.1
  • 2
    • 0030380977 scopus 로고    scopus 로고
    • A wafer-bonded floating-element shear stress microsensor with optical position sensing by photodiodes
    • A. Padmanabhan, et al., "A wafer-bonded floating-element shear stress microsensor with optical position sensing by photodiodes," Microelectromechanical Systems, Journal of, vol. 5, pp. 307-315, 1996.
    • (1996) Microelectromechanical Systems, Journal of , vol.5 , pp. 307-315
    • Padmanabhan, A.1
  • 3
    • 14044258615 scopus 로고    scopus 로고
    • A microfabricated wall shear-stress sensor with capacitative sensing
    • J. Zhe, et al., "A microfabricated wall shear-stress sensor with capacitative sensing," Microelectromechanical Systems, Journal of, vol. 14, pp. 167-175, 2005.
    • (2005) Microelectromechanical Systems, Journal of , vol.14 , pp. 167-175
    • Zhe, J.1
  • 4
    • 0033099130 scopus 로고    scopus 로고
    • A micromachined flow shear-stress sensor based on thermal transfer principles
    • C. Liu, et al., "A micromachined flow shear-stress sensor based on thermal transfer principles," Microelectromechanical Systems, Journal of, vol. 8, pp. 90-99, 1999.
    • (1999) Microelectromechanical Systems, Journal of , vol.8 , pp. 90-99
    • Liu, C.1
  • 7
    • 0036704215 scopus 로고    scopus 로고
    • Modern developments in shear-stress measurement
    • J. W. Naughton and M. Sheplak, "Modern developments in shear-stress measurement," Progress in Aerospace Sciences, vol. 38, pp. 515-570, 2002.
    • (2002) Progress in Aerospace Sciences , vol.38 , pp. 515-570
    • Naughton, J.W.1    Sheplak, M.2
  • 9
    • 26944447884 scopus 로고    scopus 로고
    • Silicon profile transformation and sidewall roughness reduction using hydrogen annealing
    • Miami, FL, USA
    • M.-C. M. Lee, et al., "Silicon Profile Transformation and Sidewall Roughness Reduction Using Hydrogen Annealing," IEEE International Conference on MEMS, Miami, FL, USA, 2005.
    • (2005) IEEE International Conference on MEMS
    • Lee, M.-C.M.1
  • 11
    • 0032654319 scopus 로고    scopus 로고
    • Passivation and corrosion of microelectrode arrays
    • G. Schmitt, et al., "Passivation and corrosion of microelectrode arrays," Electrochimica Acta, vol. 44, pp. 3865-3883, 1999.
    • (1999) Electrochimica Acta , vol.44 , pp. 3865-3883
    • Schmitt, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.