High Curie point CaBi2Nb2O9 thin films: A potential candidate for lead-free thin-film piezoelectrics

Journal of Applied Physics

Volumn 100, Issue 7, 2006, Pages

  Simoes A Z ^a   Ries, A ^a   Riccardi, C S ^a   Gonzalez, A H M ^a   Longo, E ^a   Varela, J A ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH CURIE POINT; LEAD FREE THIN FILM PIEZOELECTRIC; PLATINUM COATED SILICON SUBSTRATES; REMANENT POLARIZATION;

CAPACITANCE; DIELECTRIC PROPERTIES; FERROELECTRIC DEVICES; PIEZOELECTRIC DEVICES; POLARIZATION; SWITCHING SYSTEMS; THIN FILMS;

CALCIUM COMPOUNDS;

EID: 33749998644     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2357419     Document Type: Article

References (15)

1. R. C. Turner, P. A. Fuierer, R. E. Newnham, and T. R. Shrout, Appl. Acoust. 41, 299 (1994).
2. D. Damjanovic, Curr. Opin. Solid State Mater. Sci. 3, 469 (1998).
3. G. A. Smolenskii, V. A. Bokov, V. A. Isupov, N. N. Krainik, R. E. Pasynkov, and A. I. Sokolov, in Ferroelectrics and Related Materials, edited by, G. A. Smolenskii, (Gordon and Breach, New York, 1984), Chap..
4. C. A. P. Araujo, J. D. Cuchiaro, L. D. McMillian, M. C. Scott, and J. F. Scott, Nature (London) 374, 627 (1995).
5. G. V. Gibbs, M. B. Boisen, Jr., R. T. Downs, and K. L. Bartelmehs, (XPOWPLOT, Version 2.0, 1993.
6. K. Kato, K. Suzuki, D. Fu, K. Nishizawa, and T. Miki, Appl. Phys. Lett. 81, 3227 (2002).
7. A. Z. Simes, B. D. Stojanovic, A. Tangastev, N. Setter, and J. A. Varela, Integr. Ferroelectr. 43, 123 (2002).
8. A. Z. Simes, A. Ries, F. M. Filho, J. A. Varela, and E. Longo, Appl. Phys. Lett. 85, 5962 (2004).
9. B. S. Kang, B. H. Park, S. D. Bu, S. H. Kang, and T. W. Noh, Appl. Phys. Lett. 75, 2644 (1999).
10. S. B. Desu, H. S. Cho, and P. C. Joshi, Appl. Phys. Lett. 70, 1393 (1997).
11. H. S. Cho and S. B. Desu, Phys. Status Solidi A 161, 371 (1997).
12. I. G. Ismailzade, Bull. Acad. Sci. USSR, Phys. Ser. (Engl. Transl.) 24, 1201 (1960).
13. A. Gruverman, O. Auciello, and H. Tokumoto, Annu. Rev. Mater. Sci. 28, 101 (1998).
14. V. K. Seth and W. A. Schulze, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 36, 41 (1989).
15. S. V. Kalinin and D. A. Bonnell, Appl. Phys. Lett. 78, 1116 (2001).