Structural and electrical properties of oriented ferroelectric CaBi2Nb2O9 thin films deposited on n+-Si(100) by pulsed laser deposition

Physica Status Solidi (A) Applied Research

Volumn 161, Issue 2, 1997, Pages 371-378

  Cho, H S ^a   Desu, S B ^a  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCIUM COMPOUNDS; CAPACITORS; CRYSTAL STRUCTURE; CURRENT DENSITY; DEPOSITION; ELECTRIC FIELD EFFECTS; FERROELECTRIC MATERIALS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; MAGNETIC PROPERTIES; PERMITTIVITY MEASUREMENT; PULSED LASER APPLICATIONS;

CALCIUM BISMUTH NIOBATES; DISSIPATION FACTOR; METAL FERROELECTRIC SEMICONDUCTOR (MFS) CAPACITOR; PULSED LASER DEPOSITION;

DIELECTRIC FILMS;

EID: 0031164163     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(199706)161:2<371::AID-PSSA371>3.0.CO;2-X     Document Type: Article

References (11)

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