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Volumn 89, Issue 15, 2006, Pages

Influence of surface adsorption in improving ultrashallow junction formation

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC NITROGEN; DOPANTS; SILICON DEVICES; SURFACE ADSORPTION;

EID: 33749986002     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2360917     Document Type: Article
Times cited : (12)

References (12)
  • 1
    • 33750015554 scopus 로고    scopus 로고
    • The International Technology Roadmafor Semiconductors
    • The International Technology Roadmap for Semiconductors, 2005, http://www.itrs.net/Links/2005ITRS/Home2005.htm
    • (2005)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.