Interfacial varactor characteristics of ferroelectric thin films on high-resistivity Si substrate

Applied Physics Letters

Volumn 89, Issue 2, 2006, Pages

  Lan, Wen An ^a   Wang, Tsan Chun ^a   Huang, Ling Hui ^a   Wu, Tai Bor ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED DEFECTS; INTERFACIAL VARACTOR CHARACTERISTICS; LOW-RESISTIVITY INTERFACE; MICROWAVE FREQUENCIES;

BARIUM COMPOUNDS; DEPOSITION; MOS CAPACITORS; OXIDATION; SILICON; VARACTORS;

FERROELECTRIC THIN FILMS;

EID: 33749627731     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2214170     Document Type: Article

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