The low-frequency noise of strained silicon n-MOSFETs

AIP Conference Proceedings

Volumn 780, Issue , 2005, Pages 187-190

  Simoen, E ^a   Eneman, G ^a,b   Verheyen, P ^a   Delhougne, R ^a,b   Rooyackers, R ^a   Loo, R ^a   Vandervorst, W ^a   De Meyer, K ^a,b   Claeys, C ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Rapid Thermal Oxidation (RTO); Strain Relaxed Buffer (SRB) layer; Strained silicon substrates

Indexed keywords

EID: 33749456213     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2036728     Document Type: Conference Paper

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