Electrochemical behaviour of chromium nitride coatings with various preferred orientations deposited on steel by unbalanced magnetron sputtering

Materials Science and Technology

Volumn 22, Issue 6, 2006, Pages 653-660

  Lee, C K ^a  

^a CHING YUN UNIVERSITY   (Taiwan)

Author keywords

Chromium nitride; Electrochemical impedance spectroscopy; Electrochemical measurements; Potentiodynamic polarisation; Unbalanced magnetron sputtering

Indexed keywords

CHROMIUM COMPOUNDS; DEPOSITION; ELECTROCHEMICAL CORROSION; MAGNETRON SPUTTERING; MICROSTRUCTURE; SPECTROSCOPIC ANALYSIS; STEEL;

CHROMIUM NITRIDE; ELECTROCHEMICAL MEASUREMENTS; POTENTIODYNAMIC POLARISATION; UNBALANCED MAGNETRON SPUTTERING;

CHROMATE COATINGS;

EID: 33749395421     PISSN: 02670836     EISSN: None     Source Type: Journal    
DOI: 10.1179/174328406X100716     Document Type: Article

References (34)

1. A. S. Kao, M. F. Doerner and V. J. Novotny: J. Appl. Phys., 1989, 66, 5315.
2. B. Bhusham, Thin Solid Films, 1979, 64, 231.
3. J. Trube, H. Yabe, S. Aya, K. Marumnoto and Y. Matsui: J. Vac. Sci. Technol., 1993, 11, 2990.
4. S. Han, J. H. Lin, S. H. Tsai, S. C. Chung, D. Y. Wang, F. H. Liu and H. C. Shih: Surf. Coat. Technol., 2000, 133-134, 460.
5. S. Han, J. H. Lin, X. J. Guo, S. H. Tsai, Y. O. Su, J. H. Huang, F. H. Lu and H. C. Shih: Thin Solid Films, 2000, 377-378, 578-584.
6. H. Holleck: J. Vac. Sci. Technol. 1986, A4, 2661-2669.
7. W. D. Sproul, Surf. Coat. Technol.: 1996, 86/87, 170.
8. X. T. Zeng, S. Zhang and J. Hsieh: Surf. Coat. Technol., 1998, 102, 108.
9. B. Window and N. Savvides: J. Vac. Sci. Technol., 1986, A4, (2), 196.
10. F. Brossa, A. Cigada, S. Fare, R. Chiesa and L. Paracchini: Mater. Med., 1996, 7, 471.
11. D. M. Grant, W. J. Lo, K. G. Parker and T. L. Parker: Mater. Med., 1996, 7, 579.
12. H. W. Wang, et al.: Surf. Coal. Technol., 2000, 126, 279.
13. M. Tomlinson, et al.: Vacuum, 1999, 53, 119-121.
14. S. Han, J. H. Lin, G. H. Wang and H. C. Shih: Mater. Lett., 2003, 57, 1202-1209.
15. D. Y. Wang, J. H. Lin and W. Y. Ho: Thin Solid Films, 1998, 332, 295.
16. J. Aromaa, et al.: Mater. Sci. Eng. A, 1991, A140, 722-726.
17. W. Tato and D. Landolt: J. Electrochem. Soc., 1998, 145, 4173.
18. C. Liu, Q. Bi and A. Matthews: Corros. Sci., 2001, 43, 1953-1961.
19. C. Liu, Q. Bi, A. Leyland and A. Matthews: Corros. Sci., 2003, 45, 1257-1273.
20. Y. J. Yu, J. G. Kim, S. H. Cho and J. H. Boo: Surf. Coat. Technol., 2003, 162, 161.
21. W. K. Grant, C. Loomis, J. J. Moore, D. L. Olson, B. Mishra and A. J. Perry: Surf. Coat. Technol., 1996, 86/87, 788.
22. K. K. Shih, D. B. Dove and J. R. Crowe: J. Vac. Sci. Technol., 1996, A4, 564.
23. K. J. Vetter, 'Electrochemical kinetics', Chapter 5, 733; 1961, New York, Academic Press.
24. C. Liu, A. Leyland, Q. Bi and A. Matthews, Surf. Coat. Technol.: 2001, 141, 164-173.
25. M. Stern and A. L. Geary: J. Electrochem. Soc., 1957, 104, 56.
26. H. H. Uhlig and R. W. Revie: 'Corrosion and corrosion control', 3rd edn, 405; 1985, New York, Wiley.
27. D. A. Jones: 'Principles and prevention of corrosion', 147; 1992, New York, Macmillan.
28. T. Hurkmans, D. B. Lewis, J. S. Brooks and W. D. Münz: Surf. Coat. Technol., 1996, 86-87, 192.
29. H. Dong, Y. Sun and T. Bell: Surf. Coat. Technol., 1997, 90, 91-101.
30. J. Creus, H. Idrissi, H. Mazille, F. Sanchette and P. Jacquot, Surf. Coat. Technol., 1998, 107, 183-190.
31. C. Liu, Q. Bi, H. Ziegele, A. Leyland and A. Matthews: J. Vac. Sci. Technol., 2002, A20, (3), 772.
32. A. J. Bard and L. R. Faulanker, 'Electrochemical methods', 16; 1987, New York, Wiley.
33. S. C. Chung, S. L. Sung, C. C. Hsien and H. C. Shih: J. Appl. Electrochem., 2000, 30, 607.
34. J. Creus, H. Mazille and H. Idrissi: Surf. Coat. Technol., 2000, 130, 224-232.