Properties of Cr-N films produced by reactive sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 4, Issue 3, 1986, Pages 564-567

  Shih, K K ^a   Dove, D B ^a   Crowe, J R ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84957280658     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.573887     Document Type: Article

References (5)

1. M. Sikkens, A. Van Heereveld, and E. Vogelzang, Thin Solid Films 108, 229(1983).
2. S. Komiya and K. Tsuruoka, J. Vac. Sci. Technol. 13, 520 (1976).
3. S. Komiya, S. Ono, N. Umezu, and T. Narusawa, Thin Solid Films 45,433 (1977).
4. T. Sato, M. Tada, Y. C. Huang, and H. Takei, Thin Solid Films 54, 61 (1978).
5. L. I. Maissel and R. Glang, Handbook of Thin Film Technology (McGraw-Hill, New York, 1970), p. 13-6.