Plasma-polymerized toluene films for corrosion inhibition in microelectronic devices

Surface and Coatings Technology

Volumn 162, Issue 2-3, 2003, Pages 161-166

  Yu, Y J ^a   Kim, J G ^a   Cho, S H ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Corrosion; Plasma enhanced chemical vapor deposition (PECVD); Toluene film

Indexed keywords

COPPER; CORROSION PREVENTION; CROSSLINKING; DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROELECTRONICS; PLASMA POLYMERIZATION; SEMICONDUCTOR DEVICES; THIN FILMS; TOLUENE;

INTERCONNECT METALS;

COATINGS;

COATING; CORROSION RESISTANCE; ELECTRONICS INDUSTRY; FILM; POROSITY;

EID: 0037454546     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00582-0     Document Type: Article

References (22)