Quantification of thermal energy deposited in silicon by multiple femtosecond laser pulses

Optics Express

Volumn 14, Issue 20, 2006, Pages 9261-9268

  Tran, D V ^a   Lam, Y C ^b   Wong, B S ^b   Zheng, H Y ^c   Hardt, D E ^d  

^a SINGAPORE MIT ALLIANCE   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^d Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DATA REDUCTION; DEPOSITION; LASER BEAM EFFECTS; LASER PULSES; TEMPERATURE MEASUREMENT;

FEMTOSECOND LASER PULSES; IN SITU MEASUREMENT; INFRARED THERMOGRAPHY; THERMAL ENERGY;

THERMAL EFFECTS;

EID: 33749395362     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.009261     Document Type: Article

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