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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 5, 2006, Pages 2412-2416

Patchwork field emission properties of lanthanum monosulfide thin films

(6) Semet, V a Cahay, M b Binh, Vu Thien a Fairchild, S c Wu, X d Lockwood, D J d

a UNIVERSITÉ LYON 1 (France)

b University of Cincinnati (United States)

c AIR FORCE RESEARCH LABORATORY (United States)

d NATIONAL RESEARCH COUNCIL CANADA (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EMISSION CURRENT DENSITY; FOWLER NORDHEIM RELATION; LANTHANUM MONOSULFIDE; PATCHWORK FIELD EMISSION PROPERTIES;

ANODES; CURRENT DENSITY; ELECTRIC FIELDS; FIELD EMISSION DISPLAYS; FIELD EMISSION MICROSCOPES; PULSED LASER DEPOSITION; THIN FILMS; VACUUM APPLICATIONS;

LANTHANUM COMPOUNDS;

EID: 33749352988 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.2354161 Document Type: Article

Times cited : (16)

References (9)

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2
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- PV 2000-28 The Electrochemical Society, New York
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- The field enhancement factor γ due to a local corrugation is a function of the ratio (total corrugation height L/corrugation apex radius a). This effect is of importance, in particular, for L equal or greater than r, with r well under 1 μm.
- The field enhancement factor γ due to a local corrugation is a function of the ratio (total corrugation height L/corrugation apex radius a) [C. J. Edgcombe and U. Valdrè, J. Microsc. 203, 188 (2001)]. This effect is of importance, in particular, for L equal or greater than r, with r well under 1 μm.
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- Edgcombe, C.J.¹ Valdrè, U.²

6
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- note
- Iterative calculations have been done in order to take into consideration the variations of the Nordheim parameters with the work function and FE applied field.

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- Herring, C.¹ Nichols, M.H.²

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