Pulsed laser deposition of lanthanum monosulfide thin films on silicon substrates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 1, 2005, Pages 318-321

  Fairchild, S ^a   Jones, J ^a   Cahay, M ^b   Garre, K ^b   Draviam, P ^b   Boolchand, P ^b   Wu, X ^c   Lockwood, D J ^c  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b 705 Engineering Research Center   (United States)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

LASER ENERGY; SILICON SUBSTRATES; SUBSTRATE TEMPERATURE;

LANTHANUM COMPOUNDS; LASER BEAMS; LATTICE CONSTANTS; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; PULSED LASER DEPOSITION; SILICON; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 31144456651     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1856477     Document Type: Article

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