High performance micro-machined inductors on CMOS substrate

IEEE MTT-S International Microwave Symposium Digest

Volumn 2005, Issue , 2005, Pages 701-704

  Weon, Dae Hee ^a   Kim, Jeong Il ^a   Jeon, Jong Hyeok ^a   Mohammadi, Saeed ^a   Katehi, Linda P B ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

CMOS compatible; High frequency; High quality factor; Integrated inductor; Micromachining; Stressed metal; Three dimensional

Indexed keywords

HIGH FREQUENCY; HIGH QUALITY FACTOR; INTEGRATED INDUCTORS; STRESSED METALS;

CHROMIUM; ELECTRIC INDUCTORS; ELECTROPLATING; GOLD; MICROMACHINING; NATURAL FREQUENCIES; RESONATORS;

CMOS INTEGRATED CIRCUITS;

EID: 33749237718     PISSN: 0149645X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MWSYM.2005.1516705     Document Type: Conference Paper

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