Location control of super lateral growth grains in excimer laser crystallization of silicon thin films by microlight beam seeding

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 33-36, 2006, Pages

  Yeh, Wenchang ^a   Ke, Dunyuan ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Excimer laser annealing; Lateral grain growth; Polycrystalline silicon; Thin film transistor

Indexed keywords

CRYSTALLIZATION; EXCIMER LASERS; MELTING; SILICON; THIN FILMS;

CRYSTAL GRAINS; MICROLIGHT BEAM; POLYCRYSTALLINE SI THIN FILMS; SUPERLATERAL GROWTH (SLG);

GROWTH (MATERIALS);

EID: 33748777732     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L970     Document Type: Article

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