A crystallographic alignment method in silicon for deep, long microchannel fabrication

Journal of Micromechanics and Microengineering

Volumn 16, Issue 10, 2006, Pages 2177-2182

  James, T D ^a   Parish, G ^a   Winchester, K J ^a   Musca, C A ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MICROMECHANICS; CRYSTALLOGRAPHY; ETCHING; IONS; MOLECULAR ORIENTATION; SILICON NITRIDE;

ALIGNMENT TECHNIQUES; CHANNEL ETCHANT MASKS; CRYSTALLOGRAPHIC ALIGNMENT METHODS; MICROCHANNEL DEVICES;

SILICON;

EID: 33748776880     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/10/034     Document Type: Article

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