Photoinduced self-limited low-temperature growth of ultra-thin silicon-oxide films with water vapor

Applied Physics A: Materials Science and Processing

Volumn 85, Issue 2, 2006, Pages 145-150

  Patzner, P ^a   Osipov, A V ^b   Hess, P ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

^b INSTITUTE OF PROBLEMS OF MECHANICAL ENGINEERING   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; OXIDATION; REAL TIME SYSTEMS; SILICON COMPOUNDS;

LASER-INDUCED SILICON OXIDATION; SPECTROSCOPIC ELLIPSOMETRY; THERMAL OXIDATION; WATER OXIDATION;

ULTRATHIN FILMS;

EID: 33748677902     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-006-3683-0     Document Type: Article

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