Microstructure evolution in amorphous Ge/Si multilayers grown by magnetron sputter deposition

Journal of Materials Research

Volumn 12, Issue 7, 1997, Pages 1806-1815

  Jarrendahl K ^a,d   Ivanov, I ^a,e   Sundgren, J E ^a   Radnoczi G ^b   Czigany, Zs ^b   Greene, J E ^c  

^a LINKÖPING UNIVERSITY   (Sweden)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^c University of Illinois at Urbana Champaign   (United States)

^d North Carolina State University   (United States)

^e UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; FILM GROWTH; INTERFACES (MATERIALS); ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; MULTILAYERS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

SILICON GERMANIDE;

SEMICONDUCTOR SUPERLATTICES;

EID: 0031193118     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0249     Document Type: Article

References (36)

1. An alternative term for superlattice is multilayer but not necessarily vice versa. Since the samples in this study cannot be considered as superlattices, the term multilayer is used throughout the text.
2. W. Deubner, Annin. Phys. 5, 261 (1930).
3. J. W. M. Dumond and J. P. Youtz, Phys. Rev. 48, 703 (1935).
4. L. Esaki and R. Tsu, IBM J. Res. Develop. 14, 61 (1970).
5. H. Munekata and H. Kukimoto, Jpn. J. Appl. Phys. 22, L544 (1983).
6. B. Abeles and T. Tiedje, Phys. Rev. Lett. 51, 2003 (1983).
7. J. P. Conde, V. Chu, D. S. Chen, and S. Wagner, J. Appl. Phys. 75, 1638 (1994).
8. I. Barzen, M. Edinger, J. Scherer, S. Ulrich, K. Jung, and H. Ehrhardt, Surf. Coatings Technol. 60, 454 (1993).
9. G. H. Döhler, J. Non-Cryst. Solids 77&78, 1041 (1985).
10. Y. Kuwano, H. Tarui, T. Takahama, M. Nishikuni, Y. Hishikawa, N. Nakamura, S. Tsuda, S. Nakano, and M. Ohnishi, J. Non-Cryst. Solids 97&98, 289 (1987).
11. M. Tsukude, S. Hata, Y. Kohda, S. Miyazaki, and M. Hirose, J. Non-Cryst. Solids 97&98, 317 (1987).
12. E. Majkova, S. Luby, M. Jergel, R. Senderak, B. George, M. Vaezzadeh, and J. Ghanbaja, Thin Solid Films 238, 295 (1992); J.M. Slaughter, D.W. Schultze, C.R. Hills, A. Mirone, R. Stalio, R. N. Watts, C. Tarrio, T. B. Lucatorto, M. Krumrey, P. Mueller, and C. M. Falco, J. Apply. Phys. 76, 2144 (1994).
13. E. Majkova, S. Luby, M. Jergel, R. Senderak, B. George, M. Vaezzadeh, and J. Ghanbaja, Thin Solid Films 238, 295 (1992); J.M. Slaughter, D.W. Schultze, C.R. Hills, A. Mirone, R. Stalio, R. N. Watts, C. Tarrio, T. B. Lucatorto, M. Krumrey, P. Mueller, and C. M. Falco, J. Apply. Phys. 76, 2144 (1994).
14. B. Abeles, Superlattices and Microstructures 5, 473 (1989).
15. E. L. Z. Velasquez, M. C. A. Fantini, M. N. P. Carreño, I. Pereyra, H. Takahashi, and R. Landers, J. Appl. Phys. 75, 543 (1994).
16. S. Miyazaki, Y. Ihara, and M. Hirose, J. Non-Cryst. Solids 97&98, 887 (1987).
17. I. Honma, H. Komiyama, and K. Tanaka, J. Appl. Phys. 66, 1170 (1989).
18. S. M. Prokes and F. Spaepen, Appl. Phys. Lett. 47, 234 (1985).
19. Zs. Czigany, G. Radnóczi, K. Järrendahl, and J-E. Sundgren, J. Mater. Res. (1997, in press).
20. D. J. Miller, K. E. Gray, R. T. Kampwirth, and J. M. Murduck, Europhys. Lett. 19, 27 (1992).
21. I. Petrov, V. Orlinov, I. Ivanov, and J. Kourtev, Contrib. Plasma Phys. 28, 157 (1988).
22. I. Petrov, V. Orlinov, I. Ivanov, and J. Kourtev, Contrib. Plasma Phys. 30, 233 (1990).
23. G. Radnóczi and Á. Barna, Surf. Coating Technol. 80, 89 (1996); Á. Barna, Specimen Preparation for Transmission Electron Microscopy of Materials III, edited by R. Anderson, B. Tracy, and J. Bravman (Mater. Res. Soc. Symp. Proc. 254, Pittsburgh, PA, 1991), pp. 3-22.
24. G. Radnóczi and Á. Barna, Surf. Coating Technol. 80, 89 (1996); Á. Barna, Specimen Preparation for Transmission Electron Microscopy of Materials III, edited by R. Anderson, B. Tracy, and J. Bravman (Mater. Res. Soc. Symp. Proc. 254, Pittsburgh, PA, 1991), pp. 3-22.
25. D. K. G. de Boer, Phys. Rev. B 44, 498 (1991).
26. J. M. Cowley, Diffraction Physics (North-Holland/American Elsevier, Amsterdam, 1975).
27. S. Müller-Pfeiffer, H-J. Anklam, and W. Haubenreisser, Phys. Status Solidi 160, 491 (1990); S. Müller-Pfeiffer, H. van Kranenburg, and J. C. Lodder, Thin Solid Films 213, 143 (1992).
28. S. Müller-Pfeiffer, H-J. Anklam, and W. Haubenreisser, Phys. Status Solidi 160, 491 (1990); S. Müller-Pfeiffer, H. van Kranenburg, and J. C. Lodder, Thin Solid Films 213, 143 (1992).
29. W. D. Westwood, J. Vac. Sci. Technol. 15, 1 (1978).
30. I. Ivanov, P. Kazansky, L. Hultman, I. Petrov, and J-E. Sundgren, J. Vac. Sci. Technol. A 12, 314 (1994).
31. R. Messier and J. E. Yehoda, J. Appl. Phys. 58, 3739 (1985).
32. M. Kardar, G. Parisi, and Y-C. Zhang, Phys. Rev. Lett. 56, 889 (1986).
33. G. S. Bales, R. Bruinsma, E. A. Eklund, R, O. U. Karunasiri, J. Rudnick, and A. Zangwill, Science 249, 264 (1990).
34. G. S. Bales and A. Zangwill, J. Vac. Sci. Technol. A 9, 145 (1991).
35. C. Tang, S. Alexander, and R. Bruinsma, Phys. Rev. Lett. 64, 772 (1990).
36. Handbook of Chemistry and Physics, 73rd ed. (CRC Press, Boca Raton, FL, 1992-93), pp. 9-131, 132.