Material processing using femtosecond lasers: Repairing patterned photomasks

MRS Bulletin

Volumn 31, Issue 8, 2006, Pages 634-638

  Haight, Richard ^a   Longo, Peter ^a   Wagner, Alfred ^a  

^a NONE

Author keywords

Cr; Laser ablation; Machining; Nanoscale

Indexed keywords

CHROMIUM; ELECTRONICS INDUSTRY; FUSED SILICA; LASER ABLATION; MACHINING; MASKS; PHOTONS; PHYSICAL OPTICS; SEMICONDUCTOR DEVICE MANUFACTURE;

FEMTOSECOND PULSES; MULTIPHOTON DISSOCIATION; NANOSCALE; PHOTOMASKS;

MATERIALS SCIENCE;

EID: 33748459632     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs2006.161     Document Type: Article

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