High resolution material ablation and deposition with femtosecond lasers and applications to photomask repair

Journal of Modern Optics

Volumn 51-16, Issue 18, 2004, Pages 2781-2796

  Haight, Richard ^a   Wagner, Alfred ^a   Longo, Peter ^a   Lim, Daeyoung ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; FUSED SILICA; HARMONIC ANALYSIS; PHOTONIC PROPULSION; RELAXATION PROCESSES; SEMICONDUCTOR MATERIALS;

FEMTOSECOND LASERS; MULTIPHOTON DISSOCIATION; NANOSECOND LASERS; PHOTOMASKS;

LASER ABLATION;

EID: 11144330693     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500340408231837     Document Type: Article

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