Photolithographic deposition of ruthenium thin films by photochemical metalorganic deposition

Journal of Photopolymer Science and Technology

Volumn 19, Issue 4, 2006, Pages 459-465

  Li, Guizhi ^a   Trudel, Simon ^a   Hill, Ross H ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Direct lithography; Photochemical metalorganic deposition; Ruthenium precursor

Indexed keywords

EID: 33748453680     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.459     Document Type: Article

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