Fabrication of subwavelength surface structures combining self-assembled masking layer with plasma etching techniques

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2496-2499

  Oesterschulze, E ^a   Georgiev, G ^a   Muller Wiegand M ^a   Georgieva, A ^a   Ludolph, K ^a  

^a UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COLLOIDS; CRYSTAL ORIENTATION; INDUCTIVELY COUPLED PLASMA; LITHOGRAPHY; OXIDATION; PASSIVATION; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY;

PHOTORESIST MATERIALS; STEAM OXIDATION;

SURFACE STRUCTURE;

EID: 0942267563     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1617281     Document Type: Article

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