Surface free energy of CrN x films deposited using closed field unbalanced magnetron sputtering

Applied Surface Science

Volumn 252, Issue 23, 2006, Pages 8295-8300

  Sun, Chen Cheng ^a   Lee, Shih Chin ^a   Dai, Shyue Bin ^b,c   Fu, Yaw Shyan ^d   Wang, Yau Chyr ^e   Lee, Yu Hwe ^e  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^c Nano Win Technology Co Ltd   (Taiwan)

^d NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

^e NAN JEON INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

Contact angle; CrN x; Surface free energy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; CONTACT ANGLE; FREE ENERGY; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; MICROSTRUCTURE; SURFACE ROUGHNESS; THERMAL EFFECTS; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION;

CLOSED FIELD UNBALANCED MAGNETRON SPUTTERING; CRNX; OWENS-WENDT GEOMETRIC MEAN APPROACH; SEMICONDUCTOR IC PACKAGING;

CHROMIUM COMPOUNDS;

EID: 33748187610     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.10.055     Document Type: Article

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