Resist Heating Dependence on Subfield Scheduling in 50kV Electron Beam Maskmaking

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 718-726

  Babin, Sergey ^a   Kahng, Andrew B ^b   Mǎndoiu, Ion I ^b   Muddu, Swamy ^b  

^a Soft Services   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; ELECTRON BEAMS; LITHOGRAPHY; MASKS; SCHEDULING; SEMICONDUCTOR DEVICE MANUFACTURE; THROUGHPUT;

CRITICAL DIMENSIONS (CD); SUBFIELD SCHEDULING;

PHOTORESISTS;

EID: 1642514681     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.512442     Document Type: Conference Paper

References (12)

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