Morphological characteristics of amorphous Ge 2 Sb 2 Te 5 films after a single femtosecond laser pulse irradiation

Applied Surface Science

Volumn 252, Issue 12, 2006, Pages 4083-4090

  Zhang, Guangjun ^a   Gu, Donghong ^a   Jiang, Xiongwei ^a   Chen, Qingxi ^a   Gan, Fuxi ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Amorphous materials; Atomic force microscopy; Femtosecond laser; Scanning electron microscopy

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; INTERMETALLICS; LASER PULSES; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY;

CRYSTALLIZATION THRESHOLD; FEMTOSECOND LASER; MULTILAYER FILM; SINGLE-LAYER FILM;

GERMANIUM COMPOUNDS;

EID: 33748055126     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.06.012     Document Type: Article

References (21)

1. Sokolowski-Tinten K., Boalkowski J., and von der Linde K. Phys. Rev. B 51 (1995) 14186
2. Callan J.P., Kim A.M.T., Roeser C.A.D., and Mazur E. Phys. Rev. Lett. 86 (2001) 3650
3. Huang L., Callan P., Glezer E.N., and Mazur E. Phys. Rev. Lett. 80 (1998) 185
4. Shank C.V., Yen R., and Hirlimann C. Phys. Rev. Lett. 50 (1983) 454
5. Shank C.V., Yen R., and Hirlimann C. Phys. Rev. Lett. 51 (1983) 900
6. Rousse A., Rischel C., Fourmaux S., Uschmann I., Sebban S., Grillon G., Balcou Ph., Förster E., Geindre J.P., Audebert P., Gauthier J.C., and Hulin D. Nature 410 (2001) 65
7. Stampfli P., and Bennemann K.H. Phys. Rev. B 49 (1994) 7299
8. Stampfli P., and Brennemann K.H. Appl. Phys. A 60 (1995) 191
9. Cavalleri A., Siders C.W., Brown F.L.H., Leitner D.M., T'oth C., Squier J.A., Barty C.P.J., Wilson K.R., Sokolowski-Tinten K., Horn von Hoegen M., von der Linde D., and Kammler M. Phys. Rev. Lett. 85 (2000) 586
10. Sokolowski-tinte K., Bialkowski J., Cavalleri A., and von der Linde D. Phys. Rev. Lett. 81 (1998) 224
11. Bonse J., Wrobel J.M., Brzezinka K.-W., Esser N., and Kautek W. Appl. Surf. Sci. 202 (2002) 272
12. Downer M.C., and Shank C.V. Phys. Rev. Lett. 56 (1986) 761
13. Silvestrelli P.L., Alavi A., Parrinello M., and Frenkel D. Phys Rev. Lett. 77 (1996) 3149
14. Liu J.M., Yen R., Bloembergen N., and Hodgson R.T. Appl. Phys. Lett. 34 (1979) 864
15. Liu J.M., Yen R., Kurz H., and Bloembergen N. Appl. Phys. Lett. 39 (1981) 755
16. Borowiec A., Mackenzie M., Weatherly G.C., and Haugen H.K. Appl. Phys. A 76 (2003) 201
17. Borowiec A., Mackenzie M., Weatherly G.C., and Haugen H.K. Appl. Phys. A 77 (2003) 411
18. Zhou G.-F. Mater. Sci. Eng. A 304-306 (2001) 73
19. Sugawara K., Gotoh T., and Tanaka K. Jpn. J. Appl. Phys. 43 (2004) L676
20. González-Hernández J., Prokhorov E., and Vorobiev Yu. J. Vac. Sci. Technol. A 18 (2000) 1694
21. Afonso C.N., Solis J., Catalina F., and Kalpouzos C. Appl. Phys. Lett. 60 (1992) 3123