Improvement of empirical OPC Model Robustness using Full-Chip Aerial Image Analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 222-229

  Roessler, Thomas ^a   Frankowsky, Beate ^a   Toublan, Olivier ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Full chip aerial image analysis; Model robustness; OPC; OPC test patterns; Variable Threshold Resist models

Indexed keywords

DATA REDUCTION; IMAGE ANALYSIS; MASKS; MATHEMATICAL MODELS; OPTIMIZATION; PARAMETER ESTIMATION; PATTERN RECOGNITION; PRODUCT DESIGN;

OPTICAL PROXIMITY CORRECTION (OPC); VARIABLE THRESHOLD RESISTS;

CMOS INTEGRATED CIRCUITS;

EID: 1842475768     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518055     Document Type: Conference Paper

References (5)

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3. N. Cobb et al., " Experimental Results on Optical Proximity Correction with Variable Threshold Resist Model", Proc. SPIE 3051, 458 (1997).
4. Y. Granik, N. Cobb, T. Do, "Universal Process Modeling with VTRE for OPC", Proc. SPIE 4691, 377 (2002).
5. V. Wiaux et al., "Assessment of OPC effectiveness using two-dimensional metrics", Proc. SPIE 4691, 395 (2002).