Cl2/O2- And Cl2/N2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation

Conference Proceedings - International Conference on Indium Phosphide and Related Materials

Volumn 2005, Issue , 2005, Pages 315-318

  Van Der Heijden, R ^a   Carlstrom C F ^a   Van Der Drift, E ^b   Van Der Heijden, R W ^a   Notzel R ^a   Van Veldhoven, R ^a   Karouta, F ^a   Salemink, H W M ^a,b   Talneau, A ^c  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; INDUCTIVELY COUPLED PLASMA; LIGHT TRANSMISSION; PASSIVATION; PHOTONS; PLASMA ETCHING;

PHOTONIC CRYSTALS; SIDEWALL PASSIVATION; TRANSMISSION REDUCTION; VERTICAL SIDEWALLS;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 33747422466     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICIPRM.2005.1517489     Document Type: Conference Paper

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