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Journal of Materials Science

Volumn 41, Issue 13, 2006, Pages 4117-4121

Crystalline carbon nitride films prepared by microwave plasma chemical vapour deposition

(5) Jiang, Jinchun a Cheng, Wenjuan b Zhang, Yang c Zhu, Hesun c Shen, Dezhong c

a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b EAST CHINA NORMAL UNIVERSITY (China)

c TSINGHUA UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NITRIDE; CRYSTALLINE MATERIALS; MICROHARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYSTALLINE CARBON NITRIDE FILMS; HYBRIDIZATION; MICROWAVE PLASMAS; RHOMBOHEDRAL BARS;

THIN FILMS;

EID: 33747061918 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-005-5599-z Document Type: Conference Paper

Times cited : (6)

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