A unified statistical model for inter-die and intra-die process variation

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Volumn 2005, Issue , 2005, Pages 131-134

  Doh, Ji Seong ^a   Kim, Dae Wook ^a   Lee, Sang Hoon ^a   Lee, Jong Bae ^a   Park, Young Kwan ^a   Yoo, Moon Hyun ^a   Kong, Jeong Taek ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CORRELATION METHODS; DIGITAL INTEGRATED CIRCUITS; ELECTRIC CURRENTS; MICROPROCESSOR CHIPS; OSCILLATORS (ELECTRONIC); SENSITIVITY ANALYSIS; THRESHOLD VOLTAGE;

CIRCUIT PERFORMANCE; DIE VARIATIONS; RING OSCILLATORS; SATURATION CURRENT;

DIES;

EID: 33747043896     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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