Experimental study of an RF magnetron discharge for thin-film deposition

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 528-532

  Clenet F ^a   Briaud, Ph ^a   Turban, G ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

Deposition; Optical emission spectroscopy; Resputtering; Sputtering; Transport

Indexed keywords

ARGON; CARRIER CONCENTRATION; COMPUTATIONAL METHODS; EMISSION SPECTROSCOPY; FUNCTIONS; MATHEMATICAL MODELS; PLASMAS; PRESSURE EFFECTS; SPUTTER DEPOSITION; THIN FILMS; TITANIUM; TUNGSTEN;

OPTICAL EMISSION SPECTROSCOPY (OES); RADIO FREQUENCY (RF) MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0031365245     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00215-6     Document Type: Article

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