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1
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0003576507
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Prentice Hall, Upper Saddle River, New Jersey
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J. D. Plummer, M. D. Deal, P. B. Griffin, Silicon VLSI Technology, Prentice Hall, Upper Saddle River, New Jersey.
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Silicon VLSI Technology
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Plummer, J.D.1
Deal, M.D.2
Griffin, P.B.3
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2
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0033417558
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Synthesis of hard TiN coatings with suppressed columnar growth and reduced stress
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September/October
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M. M. Lacerda, Y. H. Chen, B. Zhou, M. U. Guruz, and Y. W. Chung, "Synthesis of hard TiN coatings with suppressed columnar growth and reduced stress" Journal of Vacuum Science and Technology A, vol. 17, no. 5, pp. 2915-2919, September/October 1999.
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(1999)
Journal of Vacuum Science and Technology A
, vol.17
, Issue.5
, pp. 2915-2919
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Lacerda, M.M.1
Chen, Y.H.2
Zhou, B.3
Guruz, M.U.4
Chung, Y.W.5
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3
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0034155923
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Mechanical properties of titanium nitride coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering
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March/April
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J. W. Lim, H. S. Park, T. H. Park, J. J. Lee, J. Joo, "Mechanical properties of titanium nitride coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering" Journal of Vacuum Science and Technology A, vol. 18, no. 2, pp. 524-528, March/April 2000.
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(2000)
Journal of Vacuum Science and Technology A
, vol.18
, Issue.2
, pp. 524-528
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Lim, J.W.1
Park, H.S.2
Park, T.H.3
Lee, J.J.4
Joo, J.5
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4
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0033882382
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The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films
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March
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P. Patsalas, C. Charitidis, and S. Logothetidis, "The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films" Surface and Coatings Technology, vol. 125, no. 1-3, pp. 335-340, March 2000.
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(2000)
Surface and Coatings Technology
, vol.125
, Issue.1-3
, pp. 335-340
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Patsalas, P.1
Charitidis, C.2
Logothetidis, S.3
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5
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84881162072
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Structure and properties of titanium nitride thin films deposited at low temperatures using direct current magnetron sputtering
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March/April
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F. Elstner, A. Ehrlich, H. Giegengack, H. Kupfer, and F. Richter, "Structure and properties of titanium nitride thin films deposited at low temperatures using direct current magnetron sputtering" Journal of Vacuum Science and Technology A, vol. 12, no. 2, pp. 476-483, March/April 1994.
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(1994)
Journal of Vacuum Science and Technology A
, vol.12
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, pp. 476-483
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Elstner, F.1
Ehrlich, A.2
Giegengack, H.3
Kupfer, H.4
Richter, F.5
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6
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0025529971
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Sequential sputter deposition of titanium nitride and aluminum
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H. Gilboa, R. Mosely, H. Talieh, and X. S. Guo, "Sequential sputter deposition of titanium nitride and aluminum" Proc. 7th IEEE VLSI Multilevel Interconnection conference, pp. 338-341, 1990.
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(1990)
Proc. 7th IEEE VLSI Multilevel Interconnection Conference
, pp. 338-341
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Gilboa, H.1
Mosely, R.2
Talieh, H.3
Guo, X.S.4
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7
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0031245815
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Characterization of TiN thin films using the bulge test and the nanoindentation technique
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October
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A. Karimi, O. R. Shojaei, T. Krumj, and J. L. Martin, "Characterization of TiN thin films using the bulge test and the nanoindentation technique" Thin Solid Films, vol. 308-309, no. 1-4, pp. 334-339, October 1997.
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(1997)
Thin Solid Films
, vol.308-309
, Issue.1-4
, pp. 334-339
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Karimi, A.1
Shojaei, O.R.2
Krumj, T.3
Martin, J.L.4
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8
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0032202897
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Mechanism of TiN barrier-metal oxidation in a ferroelectric random access memory
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November
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K. Kushida-Abdelghafar, K. Torii, S. Takatani, Y. Matsui, and Y. Fujisaki, "Mechanism of TiN barrier-metal oxidation in a ferroelectric random access memory" Electronics Letters, vol. 13, no. 11, pp. 3265-3269, November 1998.
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(1998)
Electronics Letters
, vol.13
, Issue.11
, pp. 3265-3269
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Kushida-Abdelghafar, K.1
Torii, K.2
Takatani, S.3
Matsui, Y.4
Fujisaki, Y.5
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9
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0242292093
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Control of stress and microstructure in cathodic arc deposited films
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October
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M. M. M. Bilek, R. N. Tarrant, D. R. McKenzie, S. H. N. Lim, and D. G. McCulloch, "Control of stress and microstructure in cathodic arc deposited films" IEEE Transactions on Plasma Science, vol. 31, no. 5, pp. 939-944, October 2003.
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(2003)
IEEE Transactions on Plasma Science
, vol.31
, Issue.5
, pp. 939-944
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Bilek, M.M.M.1
Tarrant, R.N.2
McKenzie, D.R.3
Lim, S.H.N.4
McCulloch, D.G.5
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10
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33749077573
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Integrated wavelength selective optical MEMS switching using ring resonator filters
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In press
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G. N. Nielson, D. Seneviratne, F. Lopez-Royo, P. R. Rakich, Y. Avrahami, M. R. Watts, H. A. Haus, H. L. Tuller, G. Barbastathis, "Integrated wavelength selective optical MEMS switching using ring resonator filters" Photon. Tech. Letters. In press.
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Photon. Tech. Letters
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Nielson, G.N.1
Seneviratne, D.2
Lopez-Royo, F.3
Rakich, P.R.4
Avrahami, Y.5
Watts, M.R.6
Haus, H.A.7
Tuller, H.L.8
Barbastathis, G.9
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