Improvement in linearity of calibration curves using matrix components as modifiers in ETV/ICP-MS and application for SBT thin film

Journal of the Ceramic Society of Japan

Volumn 114, Issue 1332, 2006, Pages 705-708

  Mitsumata, Hiroshi ^a   Mori, Toshio ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

ETV ICP MS; Matrix modifier; Metallic impurities; Semiconductor ferroelectric random access memories; Thin film; Y 1

Indexed keywords

BISMUTH; INDUCTIVELY COUPLED PLASMA; LINEARIZATION; MASS SPECTROMETRY; RANDOM ACCESS STORAGE; SEMICONDUCTOR MATERIALS; STRONTIUM; TANTALUM; THIN FILMS;

ETV/ICP-MS; MATRIX MODIFIER; METALLIC IMPURITIES; SEMICONDUCTOR FERROELECTRIC RANDOM-ACCESS MEMORIES; Y-1;

TRACE ANALYSIS;

EID: 33746637587     PISSN: 09145400     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj.114.705     Document Type: Article

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