Determination of ultratrace metallic impurities in metal-oxide thin films for ferroelectric random-access memories by precipitation separation/ICP-MS and ETAAS

Bunseki Kagaku

Volumn 52, Issue 6, 2003, Pages 447-453

  Yabuki, Motonaka ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

ETAAS; ICP MS; Precipitation separation; Semiconductor materials; Trace impurities

Indexed keywords

ALUMINUM; BISMUTH; CHROMIUM; COBALT; COPPER; IRON; LEAD; MAGNESIUM; METAL OXIDE; STRONTIUM; TANTALUM; TITANIUM; ZIRCONIUM;

ACID PRECIPITATION; ANALYTIC METHOD; ARTICLE; COMPUTER MEMORY; ELECTRIC CAPACITANCE; ELECTROSTATIC PRECIPITATION; EVALUATION; EVAPORATION; FILM; MEASUREMENT; PHASE SEPARATION; PURIFICATION; SEMICONDUCTOR; SEPARATION TECHNIQUE;

EID: 0038421756     PISSN: 05251931     EISSN: None     Source Type: Journal    
DOI: 10.2116/bunsekikagaku.52.447     Document Type: Article

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