Growth kinetics and microstructure of carbon nanotubes using open air laser chemical vapor deposition

Diamond and Related Materials

Volumn 15, Issue 9, 2006, Pages 1438-1446

  Kwok, Kinghong ^a   Chiu, Wilson K S ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

Catalytic processes; High resolution electron microscopy; Laser induced chemical vapor deposition; Nanotubes

Indexed keywords

AMORPHOUS MATERIALS; CARBON; CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; GROWTH KINETICS; HIGH RESOLUTION ELECTRON MICROSCOPY; LASER APPLICATIONS; MICROSTRUCTURE; PROPANE;

AMORPHOUS CARBON; CATALYTIC PROCESSES; CATALYTIC SURFACE; LASER-INDUCED CHEMICAL VAPOR DEPOSITION;

CARBON NANOTUBES;

EID: 33746621277     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.056     Document Type: Article

References (27)

1. Baughman R., Zakhidov A., and de Heer W. Science 297 (2002) 787
2. Hongjie D. Surf. Sci. 500 (2002) 218
3. Martel R., Schmidt T., Shea H.R., Hertel T., and Avouris Ph. Appl. Phys. Lett. 73 (1998) 2447
4. Novak J.P., Lay M.D., Perkins F.K., and Snow E.S. Solid-State Electron. 48 (2004) 1753
5. Jung M., Eun K.Y., Lee J.K., Baik Y.J., Lee K.R., and Park J.W. Diamond Relat. Mater. 10 (2001) 1235
6. Juang Z.Y., Chien I.P., Lai J.F., Lai T.S., and Tsai C.H. Diamond Relat. Mater. 13 (2004) 1203
7. Li Q., Yan H., Zhang J., and Liu Z. Carbon 42 (2004) 829
8. Moshkalyov S.A., Moreau A., Guttierrez H.R., Cotta M.A., and Swart J.W. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 112 (2004) 147
9. Shin Y.M., Jeong S.Y., Jeong H.J., Eum S.J., Yang C.W., Park C.Y., and Lee Y.H. J. Cryst. Growth 271 (2004) 81
10. Kwok K., and Chiu W. Carbon 43 (2005) 437
11. Bauerle D. Laser Processing and Chemistry (1996), Springer, New York
12. Westberg H., Boman M., Noorekrans A.S., and Carlsson J.O. Thin Solid Films 215 (1992) 126
13. Kwok K., and Chiu W. Carbon 41 (2003) 2295
14. Feron O., Langlais F., Naslain R., and Thebault J. Carbon 37 (1999) 1373
15. Becker A., and Huttinger K.J. Carbon 36 (1998) 177
16. Meyyappan M., Delzeit L., Cassell A., and Hash D. Plasma Sources Sci. Technol. 12 (2003) 205
17. Moisela A., Nasibulin A., and Kauppinen E. J. Phys., Condens. Matter 15 (2003) S3011
18. Yokoyama H., Numakura H., and Koiwa M. Acta Mater. 46 (1997) 2823
19. Wei B.Q., Vajtai R., Jung Y., Ward J., Zhang R., Ramanath G., and Ajayan P.M. Nature 416 (2002) 495
20. Morjan R.E., Maltsev V., Nerushev O., Yao Y., Falk L., and Campell E. Chem. Phys. Lett. 383 (2004) 385
21. Ting J.M., and Liao K.H. Chem. Phys. Lett. 396 (2004) 469
22. Bower C., Zhou O., Zhu W., Werder D.J., and Jin S. Appl. Phys. Lett. 77 (2000) 2767
23. Lee C.J., and Park J. Appl. Phys. Lett. 77 (2000) 3397
24. Merkulov V.I., Lowndes D.H., Wei Y.Y., Eres G., and Voelkl E. Appl. Phys. Lett. 76 (2000) 3555
25. Moody J.E., and Hendel R.H. J. Appl. Phys. 53 (1982) 4364
26. Kwok K., and Chiu W. Opt. Eng. 44 (2005) 073801
27. Louchev O., Sato Y., and Kanda H. Appl. Phys. Lett. 80 (2002) 752