SCOPUS 정보 검색 플랫폼

Volumn 57, Issue 6, 2001, Pages 540-546

Atomic force microscopy and x-ray photoelectron spectroscopy study on the passive film for type 316L stainless steel

(4) Wang, X Y a Wu, Y S a Zhang, L a Yu, Z Y a

a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING (China)

Author keywords

Atomic force microscopy; Auger electron spectroscopy; Nitric acid; Passive film; Stainless steel; X ray photoelectron microscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORROSION RESISTANCE; ELECTROCHEMISTRY; METALLIC FILMS; NITRIC ACID; PASSIVATION; PITTING; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

PASSIVE FILMS;

STAINLESS STEEL;

ATOMIC FORCE MICROSCOPY; CORROSION; SPECTROSCOPY; STAINLESS STEEL;

EID: 0035373213 PISSN: 00109312 EISSN: None Source Type: Journal
DOI: 10.5006/1.3290380 Document Type: Article

Times cited : (39)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.