Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 500-505

  Strumpfel J ^a   May, C ^a  

^a Von Ardenne Anlagentechnik GmbH   (Germany)

Author keywords

Indium tin oxide; Optical coatings; Physical vapor deposition (PVD)

Indexed keywords

EID: 14544308215     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00308-0     Document Type: Article

References (11)

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