A nano-scale alignment method for imprint lithography

Frontiers of Mechanical Engineering in China

Volumn 1, Issue 2, 2006, Pages 157-161

  Wang, Li ^a   Lu, Bing Heng ^a   Ding, Yu Cheng ^a   Qiu, Zhi Hui ^a   Liu, Hong Zhong ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Grating; Imprint lithography; Moir signal; Nan o scale alignment

Indexed keywords

EID: 33746103699     PISSN: 16733479     EISSN: 16733592     Source Type: Journal    
DOI: 10.1007/s11465-006-0014-2     Document Type: Article

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